Surface plasmon enhanced ultraviolet emission from ZnO films deposited on Ag/Si(001) by magnetron sputtering

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	Surface plasmon enhanced ultraviolet emission from ZnO films deposited on Ag/Si(001) by magnetron sputtering
	Zhang XW; You JB; Fan YM
刊名	applied physics letters
	2007
卷号	91 期号:23 页码:art. no. 231907
关键词	MOLECULAR-BEAM EPITAXY
ISSN号	0003-6951
通讯作者	zhang, xw, chinese acad sci, inst semicond, key lab semicond mat sci, beijing 100083, peoples r china. 电子邮箱地址: xwzhang@semi.ac.cn
中文摘要	the zno films were grown on ag/si(001) substrates by sputtering ag and zno targets successively in a pure ar ambient. a significant enhancement of zno ultraviolet emission and a reduction of its full width of half maximum have been observed while introducing a 100 nm ag interlayer between zno film and si substrate. furthermore, a complete suppression of the defect related visible emission was also found for the zno/ag/si sample. this improved optical performance of zno is attributed to the resonant coupling between ag surface plasmon and ultraviolet emission of zno. (c) 2007 american institute of physics.
学科主题	半导体材料
收录类别	SCI
语种	英语
公开日期	2010-03-08
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/6960]
专题	半导体研究所_中国科学院半导体研究所（2009年前）
推荐引用方式 GB/T 7714	Zhang XW,You JB,Fan YM. Surface plasmon enhanced ultraviolet emission from ZnO films deposited on Ag/Si(001) by magnetron sputtering[J]. applied physics letters,2007,91(23):art. no. 231907.
APA	Zhang XW,You JB,&Fan YM.(2007).Surface plasmon enhanced ultraviolet emission from ZnO films deposited on Ag/Si(001) by magnetron sputtering.applied physics letters,91(23),art. no. 231907.
MLA	Zhang XW,et al."Surface plasmon enhanced ultraviolet emission from ZnO films deposited on Ag/Si(001) by magnetron sputtering".applied physics letters 91.23(2007):art. no. 231907.