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	AFM investigation of effect of absorbed water layer structure on growth mechanism of octadecyltrichlorosilane self-assembled monolayer on oxidized silicon
	Li Shaowei; Zheng Yanjun; Chen Changfeng
刊名	JOURNAL OF CHEMICAL PHYSICS
	2016
卷号	144页码:244709
ISSN号	0021-9606
DOI	10.1063/1.4954835
URL标识	查看原文
收录类别	SCIE ; PUBMED
WOS记录号	WOS:000379166100047
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/6275308
专题	中国石油大学（北京）
推荐引用方式 GB/T 7714	Li Shaowei,Zheng Yanjun,Chen Changfeng. AFM investigation of effect of absorbed water layer structure on growth mechanism of octadecyltrichlorosilane self-assembled monolayer on oxidized silicon[J]. JOURNAL OF CHEMICAL PHYSICS,2016,144:244709.
APA	Li Shaowei,Zheng Yanjun,&Chen Changfeng.(2016).AFM investigation of effect of absorbed water layer structure on growth mechanism of octadecyltrichlorosilane self-assembled monolayer on oxidized silicon.JOURNAL OF CHEMICAL PHYSICS,144,244709.
MLA	Li Shaowei,et al."AFM investigation of effect of absorbed water layer structure on growth mechanism of octadecyltrichlorosilane self-assembled monolayer on oxidized silicon".JOURNAL OF CHEMICAL PHYSICS 144(2016):244709.

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