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	A new approach to plasma CVD of TiO2 photocatalyst on gamma-Al2O3 pellet filled in dielectric barrier discharges at atmospheric pressure
	Zhu, AM; Nie, LH; Zhang, XL; Shi, C; Song, ZM; Xu, Y
刊名	PLASMA SCIENCE & TECHNOLOGY
	2004
卷号	6页码:2546-2548
关键词	plasma CVD dielectric barrier discharges photocatalyst
ISSN号	1009-0630
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/6192744
专题	大连理工大学
作者单位	1.Dalian Univ Technol, Lab Plasma Phys Chem, Dalian 116024, Peoples R China. 2.Dalian Univ Technol, Ctr Nano Mat & Sci, Dalian 116024, Peoples R China.
推荐引用方式 GB/T 7714	Zhu, AM,Nie, LH,Zhang, XL,et al. A new approach to plasma CVD of TiO2 photocatalyst on gamma-Al2O3 pellet filled in dielectric barrier discharges at atmospheric pressure[J]. PLASMA SCIENCE & TECHNOLOGY,2004,6:2546-2548.
APA	Zhu, AM,Nie, LH,Zhang, XL,Shi, C,Song, ZM,&Xu, Y.(2004).A new approach to plasma CVD of TiO2 photocatalyst on gamma-Al2O3 pellet filled in dielectric barrier discharges at atmospheric pressure.PLASMA SCIENCE & TECHNOLOGY,6,2546-2548.
MLA	Zhu, AM,et al."A new approach to plasma CVD of TiO2 photocatalyst on gamma-Al2O3 pellet filled in dielectric barrier discharges at atmospheric pressure".PLASMA SCIENCE & TECHNOLOGY 6(2004):2546-2548.

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