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	Multicolor and erasable DNA photolithography
	Huang, F.; Xu, H.; Tan, W.; Liang, H.
刊名	ACS Nano
	2014
卷号	Vol.8 No.7页码:6849-6855
关键词	asymmetrical modification colloidal particles DNA photolithography photocleavage surface patterning toehold-mediated DNA strand displacement
ISSN号	1936-0851
URL标识	查看原文
公开日期	[db:dc_date_available]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/6106279
专题	湖南大学
作者单位	1.a Department of Polymer Science and Engineering, Collaborative Innovation Center of Chemistry for Energy Materials, University of Science and Technology of China, Hefei, Anhui 230026, China 2.Hefei National Laboratory for Physical Sciences at Microscale, University of Science and Technology of China, Hefei, Anhui 230026, China 3.Department of Chemistry, UF Genetics Institute, University of Florida, Gainesville, FL 32611-7200, United States 4.Molecular Science and Biomedicine Laboratory, College of Biology, Hunan University, Changsha, Hunan 410082, China
推荐引用方式 GB/T 7714	Huang, F.,Xu, H.,Tan, W.,et al. Multicolor and erasable DNA photolithography[J]. ACS Nano,2014,Vol.8 No.7:6849-6855.
APA	Huang, F.,Xu, H.,Tan, W.,&Liang, H..(2014).Multicolor and erasable DNA photolithography.ACS Nano,Vol.8 No.7,6849-6855.
MLA	Huang, F.,et al."Multicolor and erasable DNA photolithography".ACS Nano Vol.8 No.7(2014):6849-6855.

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