QQ客服 官方微博 反馈留言

	Molecular dynamics simulation of temperature effects on CF3+ etching of Si surface
	Ning Jian-Ping; Lue Xiao-Dan; Zhao Cheng-Li; Qin You-Min; He Ping-Ni; Bogaerts, A.; Gou Fu-Jun
	2010
卷号	59期号:10页码:7225-7231
URL标识	查看原文
WOS记录号	WOS:000283406400078
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5992451
专题	贵州大学
作者单位	1.[1]Minist Educ, Key Lab Radiat Phys & Technol, Chengdu 610064, Peoples R China 2.[2]Guizhou Univ, Inst Plasma Surface Interact, Guiyang 550025, Peoples R China 3.[3]Coll Guizhou Univ, Guiyang 550003, Peoples R China 4.[4]Univ Antwerp, Res Grp PLASMANT, B-2610 Antwerp, Belgium 5.[5]Fdn Mat Inst Plasma Phys, NL-3439 MN Nieuwegein, Netherlands
推荐引用方式 GB/T 7714	Ning Jian-Ping,Lue Xiao-Dan,Zhao Cheng-Li,et al. Molecular dynamics simulation of temperature effects on CF3+ etching of Si surface[J],2010,59(10):7225-7231.
APA	Ning Jian-Ping.,Lue Xiao-Dan.,Zhao Cheng-Li.,Qin You-Min.,He Ping-Ni.,...&Gou Fu-Jun.(2010).Molecular dynamics simulation of temperature effects on CF3+ etching of Si surface.,59(10),7225-7231.
MLA	Ning Jian-Ping,et al."Molecular dynamics simulation of temperature effects on CF3+ etching of Si surface".59.10(2010):7225-7231.

个性服务

查看访问统计

相关权益政策

暂无数据

收藏/分享

除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。