(p(+))Nanocrystalline/(n(-))crystalline/(n(+))nanocrystalline Si fast recovery diode with (p(+))nanocrystalline SiC inserted in cathode junction | |
Wei, Wensheng; Liu, Lulu; Zhang, Chunxi; Zheng, Junding; Ye, Jianzhu | |
2017 | |
会议名称 | 8th International Conference on Technological Advances of Thin Films and Surface Coatings (ThinFilms) |
会议日期 | 2017-06-25 |
会议地点 | Singapore, SINGAPORE |
关键词 | Si fast recovery diode Nanocrystalline Si electrode Nanocrystalline SiC buried islands |
卷号 | 320 |
页码 | 178-182 |
收录类别 | CPCI-S |
URL标识 | 查看原文 |
WOS记录号 | WOS:000402215000030 |
内容类型 | 会议论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/5939780 |
专题 | 北京航空航天大学 |
推荐引用方式 GB/T 7714 | Wei, Wensheng,Liu, Lulu,Zhang, Chunxi,et al. (p(+))Nanocrystalline/(n(-))crystalline/(n(+))nanocrystalline Si fast recovery diode with (p(+))nanocrystalline SiC inserted in cathode junction[C]. 见:8th International Conference on Technological Advances of Thin Films and Surface Coatings (ThinFilms). Singapore, SINGAPORE. 2017-06-25. |
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