Molecular dynamics simulation of deposition and growth of cu thin film on si substrate

CORC > 力学研究所 > 中国科学院力学研究所 > 高温气体动力学国家重点实验室

	Molecular dynamics simulation of deposition and growth of cu thin film on si substrate
	Zhang J(张俊); Liu C(刘崇); Shu YH(舒勇华); Fan J(樊菁)
	2012
会议名称	28th International Symposium on Rarefied Gas Dynamics (RGD)
会议日期	JUL 09-13, 2012
会议地点	Zaragoza, SPAIN
关键词	Thin film growth crystalline structure and orientation surface roughness molecular dynamics EMBEDDED-ATOM METHOD SURFACES SYSTEMS METALS
卷号	1501
页码	919-925
通讯作者	Zhang, J (reprint author), Chinese Acad Sci, State Key Lab High Temp Gas Dynam, Inst Mech, Beijing 100190, Peoples R China.
中文摘要	Growth and properties of Cu thin film deposited on Si substrate is studied using molecular dynamics method. Tersoff potential parameters for the interaction between Cu and Si are fitted to reproduce the lattice structure of copper silicide. We focus on the growth mode, crystalline structure and orientation, and surface morphology of Cu thin film. The effect of substrate temperature on the crystalline orientation and surface roughness is studied.
收录类别	CPCI
产权排序	[Zhang, Jun; Liu, Chong; Shu, Yonghua; Fan, Jing] Chinese Acad Sci, State Key Lab High Temp Gas Dynam, Inst Mech, Beijing 100190, Peoples R China
会议网址	http://dx.doi.org/10.1063/1.4769640
会议录	28TH INTERNATIONAL SYMPOSIUM ON RAREFIED GAS DYNAMICS 2012, VOLS. 1 AND 2
会议录出版者	AMER INST PHYSICS
会议录出版地	2 HUNTINGTON QUADRANGLE, STE 1NO1, MELVILLE, NY 11747-4501 USA
学科主题	Engineering ; Aerospace; Astronomy & Astrophysics
语种	英语
ISSN号	0094-243X
ISBN号	978-0-7354-1115-9
内容类型	会议论文
源URL	[http://dspace.imech.ac.cn/handle/311007/46815]
专题	力学研究所_高温气体动力学国家重点实验室
推荐引用方式 GB/T 7714	Zhang J,Liu C,Shu YH,et al. Molecular dynamics simulation of deposition and growth of cu thin film on si substrate[C]. 见:28th International Symposium on Rarefied Gas Dynamics (RGD). Zaragoza, SPAIN. JUL 09-13, 2012.http://dx.doi.org/10.1063/1.4769640.