Micro-Raman analysis on scratch of Si surface modified by ion implantation | |
Lei, Zhenkun; Pan, Xuemin; Liu, Gang; Yun, Hai; Mu, Zongxin | |
2008 | |
会议名称 | 5th International Conference on Surface Engineering |
会议日期 | 2008-01-01 |
会议地点 | Dalian Univ Technol, Dalian, PEOPLES R CHINA |
关键词 | ion implantation scratch residual stress micro-Raman Spectroscopy |
页码 | 497-+ |
会议录 | 5th International Conference on Surface Engineering |
URL标识 | 查看原文 |
内容类型 | 会议论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/5608622 |
专题 | 大连理工大学 |
作者单位 | 1.Dalian Univ Technol, State Key Lab Struct Anal Ind Equipment, Dalian 116024, Peoples R China. 2.Dalian Univ Technol, Sch Mat Sci & Engn, Dalian 116024, Peoples R China. 3.Dalian Univ Technol, Dept Naval Architecture, Dalian 116024, Peoples R China. 4.Shandong Univ Technol, Sch Transportat & Vehicle Engn, Zibo 255049, Shandong, Peoples R China. 5.Dalian Univ Technol, State key Lab Mat Modificat, Dalian 116024, Peoples R China. |
推荐引用方式 GB/T 7714 | Lei, Zhenkun,Pan, Xuemin,Liu, Gang,et al. Micro-Raman analysis on scratch of Si surface modified by ion implantation[C]. 见:5th International Conference on Surface Engineering. Dalian Univ Technol, Dalian, PEOPLES R CHINA. 2008-01-01. |
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