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Micro-Raman analysis on scratch of Si surface modified by ion implantation
Lei, Zhenkun; Pan, Xuemin; Liu, Gang; Yun, Hai; Mu, Zongxin
2008
会议名称5th International Conference on Surface Engineering
会议日期2008-01-01
会议地点Dalian Univ Technol, Dalian, PEOPLES R CHINA
关键词ion implantation scratch residual stress micro-Raman Spectroscopy
页码497-+
会议录5th International Conference on Surface Engineering
URL标识查看原文
内容类型会议论文
URI标识http://www.corc.org.cn/handle/1471x/5608622
专题大连理工大学
作者单位1.Dalian Univ Technol, State Key Lab Struct Anal Ind Equipment, Dalian 116024, Peoples R China.
2.Dalian Univ Technol, Sch Mat Sci & Engn, Dalian 116024, Peoples R China.
3.Dalian Univ Technol, Dept Naval Architecture, Dalian 116024, Peoples R China.
4.Shandong Univ Technol, Sch Transportat & Vehicle Engn, Zibo 255049, Shandong, Peoples R China.
5.Dalian Univ Technol, State key Lab Mat Modificat, Dalian 116024, Peoples R China.
推荐引用方式
GB/T 7714
Lei, Zhenkun,Pan, Xuemin,Liu, Gang,et al. Micro-Raman analysis on scratch of Si surface modified by ion implantation[C]. 见:5th International Conference on Surface Engineering. Dalian Univ Technol, Dalian, PEOPLES R CHINA. 2008-01-01.
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