QQ客服 官方微博 反馈留言

	Integrated circuit photomicrography system based on SEM
	Liu, Wei; Yin, Bo-Hua
刊名	Weixi Jiagong Jishu/Microfabrication Technology
	2008
期号	3页码:1-4
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5547826
专题	山东大学
作者单位	1.College of Electrical and Electronic Engineering, Shandong University of Technology, Zibo 255049, China 2.Institute of Electrical Engineering, Chi
推荐引用方式 GB/T 7714	Liu, Wei,Yin, Bo-Hua. Integrated circuit photomicrography system based on SEM[J]. Weixi Jiagong Jishu/Microfabrication Technology,2008(3):1-4.
APA	Liu, Wei,&Yin, Bo-Hua.(2008).Integrated circuit photomicrography system based on SEM.Weixi Jiagong Jishu/Microfabrication Technology(3),1-4.
MLA	Liu, Wei,et al."Integrated circuit photomicrography system based on SEM".Weixi Jiagong Jishu/Microfabrication Technology .3(2008):1-4.

个性服务

查看访问统计

相关权益政策

暂无数据

收藏/分享

除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。