| Crystallographic anisotropy in surface properties of brass and its dependence on the electron work function | |
| Liqiu Guo; Hao Lu; D. Y. Li; Q. X. Huang; Xu Wang; J. A. Szpunar | |
| 会议名称 | Journal of Applied Crystallography |
| 会议日期 | 2018 |
| 会议地点 | 1715-1720 |
| 关键词 | crystallographic orientation electron work function elastic modulus adhesion electric conductance |
| 会议录 | Vol.51 No.6
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| URL标识 | 查看原文 |
| 内容类型 | 会议论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/5451494 |
| 专题 | 湖南大学 |
| 作者单位 | 1.Department of Chemical and Materials Engineering, University of Alberta, Edmonton, AB, CanadaT6G 1H9 2.Shanxi Provincial Key Laboratory of Metallurgical Device Design Theory and Technology, State Key Laboratory Cultivation Base of Province–Ministry Co-construct, Taiyuan University of Science and Technology, Taiyuan030024, People's Republic of China 3.Department of Mechanical Engineering, University of Saskatchewan, Saskatoon, SK, CanadaS7N 5A9 |
| 推荐引用方式 GB/T 7714 | Liqiu Guo,Hao Lu,D. Y. Li,et al. Crystallographic anisotropy in surface properties of brass and its dependence on the electron work function[C]. 见:Journal of Applied Crystallography. 1715-1720. 2018. |
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