Podłoże do wzrostu epitaksjalnego
PERLIN PIOTR; SARZYŃSKI MARCIN; SUSKI TADEUSZ; CZERNECKI ROBERT; LESZCZYŃSKI MICHAŁ
2016-08-11
著作权人INSTYTUT WYSOKICH CIŚNIEŃ POLSKIEJ AKADEMII NAUK
专利号PL224995B1
国家波兰
文献子类授权发明
其他题名Podłoże do wzrostu epitaksjalnego
英文摘要A surface of the substrate consists in plurality of neighbouring stripe shaped flat surfaces of a width from 1 to 2000 pm. Longer edges of the flat surfaces are parallel one to another and the planes of these surfaces are disoriented relatively to the crystallographic plane of gallium nitride crystal defined by Miller-Bravais indices (0001 ), (11-22) or (11-20). Disorientation angle of each of the flat surfaces is between 0 and 3 degree and is different for each pair of neighbouring flat surfaces. Substrate according to the invention allows epitaxial growth of a layered AllnGaN structure by MOCVD or MBE method which permits for realization of a non-absorbing mirrors laser diode emitting a light of of the wavelength from 380 to 550 nm and a laser diodes array which may emit simultaneously light of various wavelengths in the range of 380 to 550 nm.
公开日期2017-02-28
申请日期2010-04-06
状态未确认
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/38521]  
专题半导体激光器专利数据库
作者单位INSTYTUT WYSOKICH CIŚNIEŃ POLSKIEJ AKADEMII NAUK
推荐引用方式
GB/T 7714
PERLIN PIOTR,SARZYŃSKI MARCIN,SUSKI TADEUSZ,et al. Podłoże do wzrostu epitaksjalnego. PL224995B1. 2016-08-11.
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