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	Use of a coefficient of a power curve to evaluate a semiconductor wafer
	BORDEN, PETER G.; NIJMEIJER, REGINA G.; KLEMME, BEVERLY J.
	2004-11-02
著作权人	SEMICONDUCTOR PHYSICS LABORATORY, INC.
专利号	US6812717
国家	美国
文献子类	授权发明
其他题名	Use of a coefficient of a power curve to evaluate a semiconductor wafer
英文摘要	A coefficient of a function that relates a measurement from a wafer to a parameter used in making the measurement (such as the power of a beam used in the measurement) is determined. The coefficient is used to evaluate the wafer (e.g. to accept or reject the wafer for further processing), and/or to control fabrication of another wafer. In one embodiment, the coefficient is used to control operation of a wafer processing unit (that may include, e.g. an ion implanter), or a heat treatment unit (such as a rapid thermal annealer).
公开日期	2004-11-02
申请日期	2001-03-05
状态	授权
内容类型	专利
源URL	[http://ir.opt.ac.cn/handle/181661/34478]
专题	半导体激光器专利数据库
作者单位	SEMICONDUCTOR PHYSICS LABORATORY, INC.
推荐引用方式 GB/T 7714	BORDEN, PETER G.,NIJMEIJER, REGINA G.,KLEMME, BEVERLY J.. Use of a coefficient of a power curve to evaluate a semiconductor wafer. US6812717. 2004-11-02.

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