| Experimental Study of the Effect of Applied Magnetic Field on Plasma Properties of Unbalanced Magnetron Sputtering | |
| Mu Zongxin; Wang Chun; Mu Xiaodong; Jia Li; Liu Shengguang; Dong Chuang | |
| 刊名 | PLASMA SCIENCE & TECHNOLOGY
 |
| 2010 | |
| 卷号 | 12页码:571-576 |
| 关键词 | plasma magnatron sputtering oscillation resonance |
| ISSN号 | 1009-0630 |
| URL标识 | 查看原文 |
| 内容类型 | 期刊论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/5268504 |
| 专题 | 大连理工大学 |
| 作者单位 | Dalian Univ Technol, Sch Phys & Optoelect Technol, Key Lab Mat Modificat Laser Ion & Electron Beams, Minist Educ, Dalian 116024, Peoples R China. |
| 推荐引用方式 GB/T 7714 | Mu Zongxin,Wang Chun,Mu Xiaodong,et al. Experimental Study of the Effect of Applied Magnetic Field on Plasma Properties of Unbalanced Magnetron Sputtering[J]. PLASMA SCIENCE & TECHNOLOGY,2010,12:571-576. |
| APA | Mu Zongxin,Wang Chun,Mu Xiaodong,Jia Li,Liu Shengguang,&Dong Chuang.(2010).Experimental Study of the Effect of Applied Magnetic Field on Plasma Properties of Unbalanced Magnetron Sputtering.PLASMA SCIENCE & TECHNOLOGY,12,571-576. |
| MLA | Mu Zongxin,et al."Experimental Study of the Effect of Applied Magnetic Field on Plasma Properties of Unbalanced Magnetron Sputtering".PLASMA SCIENCE & TECHNOLOGY 12(2010):571-576. |
| 个性服务 |
| 查看访问统计 |
| 相关权益政策 |
| 暂无数据 |
| 收藏/分享 |
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。
修改评论