p型单晶硅涂源掺锰新方法 | |
崔志明; 巴维真; 陈朝阳; 蔡志军; 丛秀云 | |
刊名 | 电子元件与材料 |
2005 | |
卷号 | 24期号:6页码:21-23 |
关键词 | 电子技术 扩散源 补偿度 固相反应 锰硅化物 |
ISSN号 | 1001-2028 |
其他题名 | study of manganese doped p-type single crystal silicon in the daubing source |
中文摘要 | 研究了扩散源的浓度与掺杂后硅材料补偿度之间的关系。以MnCl2·4H2O乙醇溶液为扩散源,涂在初始电阻率为3.8?·cm的p型单晶硅片表面,在高温(1200℃)下掺杂锰后,在室温避光条件下,用SDY—5型双电测四探针仪测样品电阻率ρ。改变扩散源的浓度重复实验,用XRD对扩散后的样品进行分析,结果表明:当硅片表面浓度为23.4×10 8mol/cm2时,扩散后样品体电阻率的径向不均匀度在5%以内,扩散后硅片的补偿度最大。 |
英文摘要 | MnCl2 ? 4H2O ethanol solution was daubed to a surface of p-type single crystal Si disc of 3.8 Q. ? cm as a Mn dopant source, and the sample was heated at 1 200 °C to do Mn diffusion. Experiments were repeated by changing concentration of the solution and obtaining different surface density of daubed source. Resistivities of the doped samples were measured with SDY-5 four-probe device at room temperature and photophobic condition. The samples were also analyzed using X-ray diferaction method. Experimental results show that resistivity and compensation degree of the doped samples both obtain maximum values when surface density of the daubed source is 23.4xlO"8 mol/cm2, while radial uniformity of resistivity of the sample is within 5%. |
学科主题 | Engineering (provided by Thomson Reuters) |
公开日期 | 2012-11-29 |
内容类型 | 期刊论文 |
源URL | [http://ir.xjipc.cas.cn/handle/365002/2138] |
专题 | 新疆理化技术研究所_材料物理与化学研究室 |
作者单位 | 中国科学院新疆理化技术研究所;中国科学院研究生院 |
推荐引用方式 GB/T 7714 | 崔志明,巴维真,陈朝阳,等. p型单晶硅涂源掺锰新方法[J]. 电子元件与材料,2005,24(6):21-23. |
APA | 崔志明,巴维真,陈朝阳,蔡志军,&丛秀云.(2005).p型单晶硅涂源掺锰新方法.电子元件与材料,24(6),21-23. |
MLA | 崔志明,et al."p型单晶硅涂源掺锰新方法".电子元件与材料 24.6(2005):21-23. |
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