Structural, mechanical and tribological characterizations of a-C:H:Si films prepared by a hybrid PECVD and sputtering technique,

CORC > 兰州化学物理研究所 > 中国科学院兰州化学物理研究所 > 固体润滑国家重点实验室

	Structural, mechanical and tribological characterizations of a-C:H:Si films prepared by a hybrid PECVD and sputtering technique,
	Zhou HD(周惠娣); Li HX(李红轩); Ji L(吉利); Chen JM(陈建敏); Chen JM(陈建敏)
刊名	Journal of Physics D: Applied Physics
	2009
卷号	42 页码:165407(1-13)
ISSN号	0022-3727
通讯作者	陈建敏
中文摘要	a-C:H:Si ﬁlms were prepared under different CH4/Ar ratios by a hybrid radio frequency plasma-enhanced chemical vapour deposition (RFPECVD) and unbalanced magnetron sputtering technique. Characterizations showed that the CH4/Ar ratio affected not only the content but also the chemical state of the doped Si, thus further affecting the microstructures,mechanical and tribological performances of the a-C:H:Si ﬁlms. Generally, when the CH4/Ar ratio was low ( 4/2), the Si-doping content dropped with increased CH4 percentage,accompanied by a decreased sp3 (C–Si+C–C)/sp2(C=C), increased ID/IG ratio and up-shift of the G peak position, as can be seen from the Raman spectra, while at a higher CH4 percentage(e.g. CH4/Ar = 5/2), the prepared a-C:H:Si ﬁlms exhibited a series of aberrant properties due to the incorporation of abundant H and the high oxidization of the doped Si. Anotherunique characteristic of our ﬁlms was the presence of numerous Si–Si bonds at high Sicontent, which was not observed in the a-C:H:Si ﬁlms produced by the decomposition of Si-containing gaseous precursors. Moreover, although Si incorporation improved suchproperties of the DLC ﬁlms as adhesion strength, internal stress and tribological moisturesensitivity, its effectiveness in enhancing the mechanical and tribological performances were governed not by the Si-doping content or sp3-C fraction but by the ﬁlm continuity or adhesion (minimized interlinking destruction by the Si–H, C–H, Si–O–Si bonds) and sp2 (C=C) fraction (based on the ﬁlm continuity).
学科主题	材料科学与物理化学
收录类别	SCI
资助信息	the National Natural Science Foundation of China (Grant Nos 50705093;50575217);the Innovative Group Foundation from NSFC (Grant No 50421502);the National 973 Project (No 2007CB607601)
语种	英语
公开日期	2012-11-13
内容类型	期刊论文
源URL	[http://210.77.64.217/handle/362003/2083]
专题	兰州化学物理研究所_固体润滑国家重点实验室兰州化学物理研究所_先进润滑与防护材料研究发展中心
通讯作者	Chen JM(陈建敏); Chen JM(陈建敏)
推荐引用方式 GB/T 7714	Zhou HD,Li HX,Ji L,et al. Structural, mechanical and tribological characterizations of a-C:H:Si films prepared by a hybrid PECVD and sputtering technique,[J]. Journal of Physics D: Applied Physics,2009,42:165407(1-13).
APA	周惠娣,李红轩,吉利,陈建敏,&陈建敏.(2009).Structural, mechanical and tribological characterizations of a-C:H:Si films prepared by a hybrid PECVD and sputtering technique,.Journal of Physics D: Applied Physics,42,165407(1-13).
MLA	周惠娣,et al."Structural, mechanical and tribological characterizations of a-C:H:Si films prepared by a hybrid PECVD and sputtering technique,".Journal of Physics D: Applied Physics 42(2009):165407(1-13).