The induction plasma chemical reactor: Part II. Kinetic model

CORC > 力学研究所 > 中国科学院力学研究所 > 力学所知识产出(1956-2008)

	The induction plasma chemical reactor: Part II. Kinetic model
	Zhao GY; Mostaghimi J; Boulos MI
刊名	Plasma Chemistry and Plasma Processing
	1990
卷号	10 期号:1 页码:151-166
关键词	Induction plasma - modeling - chemical kinetics - dissociation of silicon tetrachloride
ISSN号	0272-4324
中文摘要	A kinetic model has been developed for the prediction of the concentration gelds in an rf plasma reactor. A sample calculation for a SiCl4/H2 system is then performed. The model considers the mixing processes along with the kinetics of seven reactions involving the decomposition of these reactants. The results obtained are compared to those assuming chemical equilibrium. The predictions indicate that an equilibrium assumption will result in lower predicted temperature fields in the reactor. Furthermore, for the chemical system considered here, while differences exist between the concentration fields obtained by the two models, the differences are not substantial.
类目[WOS]	Engineering, Chemical ; Physics, Applied ; Physics, Fluids & Plasmas
研究领域[WOS]	Engineering ; Physics
收录类别	SCI
语种	英语
WOS记录号	WOS:A1990CT88500009
公开日期	2009-08-03 ; 2010-08-20
内容类型	期刊论文
源URL	[http://dspace.imech.ac.cn/handle/311007/39596]
专题	力学研究所_力学所知识产出(1956-2008)
推荐引用方式 GB/T 7714	Zhao GY,Mostaghimi J,Boulos MI. The induction plasma chemical reactor: Part II. Kinetic model[J]. Plasma Chemistry and Plasma Processing,1990,10(1):151-166.
APA	Zhao GY,Mostaghimi J,&Boulos MI.(1990).The induction plasma chemical reactor: Part II. Kinetic model.Plasma Chemistry and Plasma Processing,10(1),151-166.
MLA	Zhao GY,et al."The induction plasma chemical reactor: Part II. Kinetic model".Plasma Chemistry and Plasma Processing 10.1(1990):151-166.