Tristate electrochemical metallization memory based in the hydrogenated nanocrystalline silicon films | |
Yan, X. B.[1]; Chen, Y. F.[2]; Hao, H.[3]; Liu, Q.[4]; Zhang, E. P.[5]; Shi, S. S.[6]; Lou, J. Z.[7] | |
刊名 | APPLIED PHYSICS LETTERS |
2014 | |
卷号 | 105期号:7 |
ISSN号 | 0003-6951 |
DOI | http://dx.doi.org/10.1063/1.4893601 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/5079638 |
专题 | 河北大学 |
作者单位 | 1.[1]Hebei Univ, Coll Electron & Informat Engn, Baoding 071002, Peoples R China. 2.Chinese Acad Sci, Inst Microelect, Lab Nanofabricat & Novel Devices Integrated Techn, Beijing 100029, Peoples R China. 3.[2]Hebei Univ, Coll Electron & Informat Engn, Baoding 071002, Peoples R China. 4.[3]Hebei Univ, Coll Electron & Informat Engn, Baoding 071002, Peoples R China. 5.[4]Chinese Acad Sci, Inst Microelect, Lab Nanofabricat & Novel Devices Integrated Techn, Beijing 100029, Peoples R China. 6.[5]Hebei Univ, Coll Electron & Informat Engn, Baoding 071002, Peoples R China. 7.[6]Hebei Univ, Coll Electron & Informat Engn, Baoding 071002, Peoples R China. 8.[7]Hebei Univ, Coll Electron & Informat Engn, Baoding 071002, Peoples R China. |
推荐引用方式 GB/T 7714 | Yan, X. B.[1],Chen, Y. F.[2],Hao, H.[3],et al. Tristate electrochemical metallization memory based in the hydrogenated nanocrystalline silicon films[J]. APPLIED PHYSICS LETTERS,2014,105(7). |
APA | Yan, X. B.[1].,Chen, Y. F.[2].,Hao, H.[3].,Liu, Q.[4].,Zhang, E. P.[5].,...&Lou, J. Z.[7].(2014).Tristate electrochemical metallization memory based in the hydrogenated nanocrystalline silicon films.APPLIED PHYSICS LETTERS,105(7). |
MLA | Yan, X. B.[1],et al."Tristate electrochemical metallization memory based in the hydrogenated nanocrystalline silicon films".APPLIED PHYSICS LETTERS 105.7(2014). |
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