Comparative study of properties of ZnO/GaN/Al2O3 and ZnO/Al2O3 films grown by low-pressure metal organic chemical vapour deposition

	Comparative study of properties of ZnO/GaN/Al2O3 and ZnO/Al2O3 films grown by low-pressure metal organic chemical vapour deposition
	Zhao B. J. ; Yang H. J. ; Du G. T. ; Miao G. Q. ; Yang T. P. ; Zhang Y. T. ; Gao Z. M. ; Wang J. Z. ; Fang X. J. ; Liu D. L. ; Li W. C. ; Ma Y. ; Yang X. T. ; Liu B. Y.
刊名	Chinese Physics Letters
	2003
卷号	20 期号:11 页码:2045-2048
ISSN号	0256-307X
其他题名	论文其他题名
合作状况	合作性质
收录类别	SCI
语种	英语
公开日期	2012-10-21
内容类型	期刊论文
源URL	[http://ir.ciomp.ac.cn/handle/181722/25113]
专题	长春光学精密机械与物理研究所_中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Zhao B. J.,Yang H. J.,Du G. T.,et al. Comparative study of properties of ZnO/GaN/Al2O3 and ZnO/Al2O3 films grown by low-pressure metal organic chemical vapour deposition[J]. Chinese Physics Letters,2003,20(11):2045-2048.
APA	Zhao B. J..,Yang H. J..,Du G. T..,Miao G. Q..,Yang T. P..,...&Liu B. Y..(2003).Comparative study of properties of ZnO/GaN/Al2O3 and ZnO/Al2O3 films grown by low-pressure metal organic chemical vapour deposition.Chinese Physics Letters,20(11),2045-2048.
MLA	Zhao B. J.,et al."Comparative study of properties of ZnO/GaN/Al2O3 and ZnO/Al2O3 films grown by low-pressure metal organic chemical vapour deposition".Chinese Physics Letters 20.11(2003):2045-2048.