Compositional and structural properties of TiO2-xNx thin films deposited by radio-frequency magnetron sputtering

	Compositional and structural properties of TiO2-xNx thin films deposited by radio-frequency magnetron sputtering
	Jing S. W. ; Liu Y. C. ; Liang Y. ; Ma J. G. ; Lu Y. M. ; Shen D. Z. ; Zhang J. Y. ; Fan X. W. ; Mu R. X.
刊名	Chinese Physics Letters
	2006
卷号	23 期号:3 页码:682-685
ISSN号	0256-307X
其他题名	论文其他题名
合作状况	合作性质
收录类别	SCI
语种	英语
公开日期	2012-10-21
内容类型	期刊论文
源URL	[http://ir.ciomp.ac.cn/handle/181722/24929]
专题	长春光学精密机械与物理研究所_中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Jing S. W.,Liu Y. C.,Liang Y.,et al. Compositional and structural properties of TiO2-xNx thin films deposited by radio-frequency magnetron sputtering[J]. Chinese Physics Letters,2006,23(3):682-685.
APA	Jing S. W..,Liu Y. C..,Liang Y..,Ma J. G..,Lu Y. M..,...&Mu R. X..(2006).Compositional and structural properties of TiO2-xNx thin films deposited by radio-frequency magnetron sputtering.Chinese Physics Letters,23(3),682-685.
MLA	Jing S. W.,et al."Compositional and structural properties of TiO2-xNx thin films deposited by radio-frequency magnetron sputtering".Chinese Physics Letters 23.3(2006):682-685.