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	Multiple short pulse process for low-temperature atomic layer deposition and its transient steric hindrance
	Wang, HR; Wang, ZY; Xu, XC; Liu, YF; Chen, C; Chen, P; Hu, W; Duan, Y
刊名	APPLIED PHYSICS LETTERS
	2019
卷号	Vol.114 No.20
ISSN号	0003-6951;1077-3118
URL标识	查看原文
公开日期	[db:dc_date_available]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4749101
专题	湖南大学
作者单位	1.Jilin Univ, Coll Elect Sci & Engn, State Key Lab Integrated Optoelect, Changchun 130012, Jilin, Peoples R China 2.Hunan Univ, Sch Phys & Elect, IFSA Collaborat Innovat Ctr, Key Lab Micro Nanooptoelect Devices,Minist Educ, Changsha 410082, Hunan, Peoples R China
推荐引用方式 GB/T 7714	Wang, HR,Wang, ZY,Xu, XC,et al. Multiple short pulse process for low-temperature atomic layer deposition and its transient steric hindrance[J]. APPLIED PHYSICS LETTERS,2019,Vol.114 No.20.
APA	Wang, HR.,Wang, ZY.,Xu, XC.,Liu, YF.,Chen, C.,...&Duan, Y.(2019).Multiple short pulse process for low-temperature atomic layer deposition and its transient steric hindrance.APPLIED PHYSICS LETTERS,Vol.114 No.20.
MLA	Wang, HR,et al."Multiple short pulse process for low-temperature atomic layer deposition and its transient steric hindrance".APPLIED PHYSICS LETTERS Vol.114 No.20(2019).

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