Spanning the "Parameter Space" of Chemical Vapor Deposition Graphene Growth with Quantum Chemical Simulations | |
Page, Alister J.; Mitchell, Izaac; Li, Hai-Bei; Wang, Ying; Jiao, Meng-gai; Irle, Stephan; Morokuma, Keiji | |
刊名 | JOURNAL OF PHYSICAL CHEMISTRY C
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2016 | |
卷号 | 120期号:26页码:13851-13864 |
DOI | 10.1021/acs.jpcc.6b02673 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/4689317 |
专题 | 山东大学 |
作者单位 | 1.Univ Newcastle, Newcastle Inst Energy & Resources, Callaghan, NSW 2308, Australia. 2.Shandong Univ, |
推荐引用方式 GB/T 7714 | Page, Alister J.,Mitchell, Izaac,Li, Hai-Bei,et al. Spanning the "Parameter Space" of Chemical Vapor Deposition Graphene Growth with Quantum Chemical Simulations[J]. JOURNAL OF PHYSICAL CHEMISTRY C,2016,120(26):13851-13864. |
APA | Page, Alister J..,Mitchell, Izaac.,Li, Hai-Bei.,Wang, Ying.,Jiao, Meng-gai.,...&Morokuma, Keiji.(2016).Spanning the "Parameter Space" of Chemical Vapor Deposition Graphene Growth with Quantum Chemical Simulations.JOURNAL OF PHYSICAL CHEMISTRY C,120(26),13851-13864. |
MLA | Page, Alister J.,et al."Spanning the "Parameter Space" of Chemical Vapor Deposition Graphene Growth with Quantum Chemical Simulations".JOURNAL OF PHYSICAL CHEMISTRY C 120.26(2016):13851-13864. |
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