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	All-Silicon Topological Semimetals with Closed Nodal Line
	Zhifeng Liu; Hongli Xin; Li Fu; Yingqiao Liu; Tielei Song; Xin Cui; Guojun Zhao; Jijun Zhao
刊名	The Journal of Physical Chemistry Letters
	2019
卷号	Vol.10 No.2页码:244-250
ISSN号	1948-7185
URL标识	查看原文
公开日期	[db:dc_date_available]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4617491
专题	湖南大学
作者单位	School of Physical Science and Technology, Inner Mongolia University, Hohhot 010021, China Beijing Computational Science Research Center, Beijing 100094, China # Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Ministry of Education, Dalian 116024, China
推荐引用方式 GB/T 7714	Zhifeng Liu,Hongli Xin,Li Fu,et al. All-Silicon Topological Semimetals with Closed Nodal Line[J]. The Journal of Physical Chemistry Letters,2019,Vol.10 No.2:244-250.
APA	Zhifeng Liu.,Hongli Xin.,Li Fu.,Yingqiao Liu.,Tielei Song.,...&Jijun Zhao.(2019).All-Silicon Topological Semimetals with Closed Nodal Line.The Journal of Physical Chemistry Letters,Vol.10 No.2,244-250.
MLA	Zhifeng Liu,et al."All-Silicon Topological Semimetals with Closed Nodal Line".The Journal of Physical Chemistry Letters Vol.10 No.2(2019):244-250.

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