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	All-Silicon Topological Semimetals with Closed Nodal Line
	Liu, Zhifeng; Xin, Hongli; Fu, Li; Liu, Yingqiao; Song, Tielei; Cui, Xin; Zhao, Guojun; Zhao, Jijun
刊名	JOURNAL OF PHYSICAL CHEMISTRY LETTERS
	2019
卷号	Vol.10 No.2页码:244-250
ISSN号	1948-7185
URL标识	查看原文
公开日期	[db:dc_date_available]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4611419
专题	湖南大学
作者单位	1.Inner Mongolia Univ, Sch Phys Sci & Technol, Hohhot 010021, Peoples R China 2.Beijing Computat Sci Res Ctr, Beijing 100094, Peoples R China 3.Dalian Univ Technol, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China
推荐引用方式 GB/T 7714	Liu, Zhifeng,Xin, Hongli,Fu, Li,et al. All-Silicon Topological Semimetals with Closed Nodal Line[J]. JOURNAL OF PHYSICAL CHEMISTRY LETTERS,2019,Vol.10 No.2:244-250.
APA	Liu, Zhifeng.,Xin, Hongli.,Fu, Li.,Liu, Yingqiao.,Song, Tielei.,...&Zhao, Jijun.(2019).All-Silicon Topological Semimetals with Closed Nodal Line.JOURNAL OF PHYSICAL CHEMISTRY LETTERS,Vol.10 No.2,244-250.
MLA	Liu, Zhifeng,et al."All-Silicon Topological Semimetals with Closed Nodal Line".JOURNAL OF PHYSICAL CHEMISTRY LETTERS Vol.10 No.2(2019):244-250.

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