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	Multiple short pulse process for low-temperature atomic layer deposition and its transient steric hindrance.
	Wang, Haoran; Wang, Zhenyu; Xu, Xiangchen; Liu, Yunfei; Chen, Chen; Chen, Ping; Hu, Wei; Duan, Yu
刊名	Applied Physics Letters
	2019
卷号	Vol.114 No.20
ISSN号	0003-6951
URL标识	查看原文
公开日期	[db:dc_date_available]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4609943
专题	湖南大学
作者单位	1.State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China 2.Key Laboratory for Micro-/Nano-Optoelectronic Devices of Ministry of Education, IFSA Collaborative Innovation Center, School of Physics and Electronics, Hunan University, Changsha 410082, China
推荐引用方式 GB/T 7714	Wang, Haoran,Wang, Zhenyu,Xu, Xiangchen,et al. Multiple short pulse process for low-temperature atomic layer deposition and its transient steric hindrance.[J]. Applied Physics Letters,2019,Vol.114 No.20.
APA	Wang, Haoran.,Wang, Zhenyu.,Xu, Xiangchen.,Liu, Yunfei.,Chen, Chen.,...&Duan, Yu.(2019).Multiple short pulse process for low-temperature atomic layer deposition and its transient steric hindrance..Applied Physics Letters,Vol.114 No.20.
MLA	Wang, Haoran,et al."Multiple short pulse process for low-temperature atomic layer deposition and its transient steric hindrance.".Applied Physics Letters Vol.114 No.20(2019).

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