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A 2 nm low temperature GaN spacer to improve the transport properties of two-dimensional electron gas in AlGaN/InAlN/AlN/GaN heterostructures
Ding, Jieqin; Wang, Xiaoliang; Xiao, Hongling; Wang, Cuimei; Chen, Hong; Bi, Yang; Deng, Qinwen; Zhang, Jingwen; Hou, Xun
刊名APPLIED PHYSICS LETTERS
2012
卷号101期号:[db:dc_citation_issue]
ISSN号0003-6951
DOI[db:dc_identifier_doi]
URL标识查看原文
WOS记录号[DB:DC_IDENTIFIER_WOSID]
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/4452851
专题西安交通大学
推荐引用方式
GB/T 7714
Ding, Jieqin,Wang, Xiaoliang,Xiao, Hongling,et al. A 2 nm low temperature GaN spacer to improve the transport properties of two-dimensional electron gas in AlGaN/InAlN/AlN/GaN heterostructures[J]. APPLIED PHYSICS LETTERS,2012,101([db:dc_citation_issue]).
APA Ding, Jieqin.,Wang, Xiaoliang.,Xiao, Hongling.,Wang, Cuimei.,Chen, Hong.,...&Hou, Xun.(2012).A 2 nm low temperature GaN spacer to improve the transport properties of two-dimensional electron gas in AlGaN/InAlN/AlN/GaN heterostructures.APPLIED PHYSICS LETTERS,101([db:dc_citation_issue]).
MLA Ding, Jieqin,et al."A 2 nm low temperature GaN spacer to improve the transport properties of two-dimensional electron gas in AlGaN/InAlN/AlN/GaN heterostructures".APPLIED PHYSICS LETTERS 101.[db:dc_citation_issue](2012).
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