Influence of Oxygen Pressure on Structures and Electrical Properties of Lead-free (K0.44Na0.52Li0.04)(Nb0.86Ta0.10Sb0.04)O3 Thin Films Deposited by Pulsed Laser Deposition | |
Tian, Aifen; Ren, Wei; Shi, Peng; Wu, Xiaoqing; Chen, Xiaofeng | |
2012 | |
关键词 | Dielectric and ferroelectric properties Pulsed laser deposition Lead-free potassium sodium niobate Thin films |
卷号 | 139 |
期号 | [db:dc_citation_issue] |
DOI | [db:dc_identifier_doi] |
页码 | 14-19 |
会议录 | INTEGRATED FERROELECTRICS |
URL标识 | 查看原文 |
ISSN号 | 1058-4587 |
WOS记录号 | [DB:DC_IDENTIFIER_WOSID] |
内容类型 | 会议论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/4451202 |
专题 | 西安交通大学 |
推荐引用方式 GB/T 7714 | Tian, Aifen,Ren, Wei,Shi, Peng,et al. Influence of Oxygen Pressure on Structures and Electrical Properties of Lead-free (K0.44Na0.52Li0.04)(Nb0.86Ta0.10Sb0.04)O3 Thin Films Deposited by Pulsed Laser Deposition[C]. 见:. |
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