Heavy oxygen water preparation device has discharge circuit which regulates voltage of plasma reactor which is arranged with cooling water circulation device which controls temperature and flow rate of cooling water. | |
GAO C GUO H WANG L YI Y ZHU Q | |
2015 | |
公开日期 | 2015-06-03 |
URL标识 | 查看原文 |
申请日期 | 2015-01-22 |
内容类型 | 专利 |
URI标识 | http://www.corc.org.cn/handle/1471x/4413054 |
专题 | 大连理工大学 |
作者单位 | UNIV DALIAN TECHNOLOGY (UYDA-C |
推荐引用方式 GB/T 7714 | GAO C GUO H WANG L YI Y ZHU Q. Heavy oxygen water preparation device has discharge circuit which regulates voltage of plasma reactor which is arranged with cooling water circulation device which controls temperature and flow rate of cooling water.. 2015-01-01. |
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