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	Nonuniform plasma diffusion and multi-pulse effect in plasma-based ion implantation
	Zheng, B. C.; Lei, M. K.
刊名	NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
	2015
卷号	343页码:83-88
关键词	Plasma-based ion implantation (PBII) Fluid model Plasma diffusion Multi-pulse
ISSN号	0168-583X
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4405715
专题	大连理工大学
作者单位	Dalian Univ Technol, Sch Mat Sci & Engn, Surface Engn Lab, Dalian 116024, Peoples R China.
推荐引用方式 GB/T 7714	Zheng, B. C.,Lei, M. K.. Nonuniform plasma diffusion and multi-pulse effect in plasma-based ion implantation[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,2015,343:83-88.
APA	Zheng, B. C.,&Lei, M. K..(2015).Nonuniform plasma diffusion and multi-pulse effect in plasma-based ion implantation.NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,343,83-88.
MLA	Zheng, B. C.,et al."Nonuniform plasma diffusion and multi-pulse effect in plasma-based ion implantation".NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 343(2015):83-88.

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