Introduction of helium into metals by magnetron sputtering deposition method

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	Introduction of helium into metals by magnetron sputtering deposition method
	H. Zheng ; S. Liu ; H. B. Yu ; L. B. Wang ; C. Z. Liu ; L. Q. Shi
刊名	Materials Letters
	2005
卷号	59 期号:8-9 页码:1071-1075
关键词	helium Ti film magnetron sputtering thermodesorption solid-phases titanium tritide bubbles energy
ISSN号	0167-577X
中文摘要	High concentration helium, up to 16 at.%, was introduced into Ti films through magnetron sputtering method in a He/Ar complex atmosphere. The introduced helium distributes homogeneously in the films and mainly forms small helium bubbles. Helium thermodesorption experiments were carried out, from which it was found that the thermodesorption properties of the introduced 4 He are similar to those of radiogenic He-3 in titanium tritides. Titanium alloy films containing helium were also prepared through this way and a comparison of thermodesorption properties was made between them and Ti-He films. (C) 2004 Elsevier B.V. All rights reserved.
原文出处	://WOS:000227164000048
公开日期	2012-04-14
内容类型	期刊论文
源URL	[http://ir.imr.ac.cn/handle/321006/35275]
专题	金属研究所_中国科学院金属研究所
推荐引用方式 GB/T 7714	H. Zheng,S. Liu,H. B. Yu,et al. Introduction of helium into metals by magnetron sputtering deposition method[J]. Materials Letters,2005,59(8-9):1071-1075.
APA	H. Zheng,S. Liu,H. B. Yu,L. B. Wang,C. Z. Liu,&L. Q. Shi.(2005).Introduction of helium into metals by magnetron sputtering deposition method.Materials Letters,59(8-9),1071-1075.
MLA	H. Zheng,et al."Introduction of helium into metals by magnetron sputtering deposition method".Materials Letters 59.8-9(2005):1071-1075.