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	Enhanced radiation tolerance of nanochannel V films through defects release
	Zhang, Hongxiu; Ren, Feng; Wang, Yongqiang; Hong, Mengqing; Xiao, Xiangheng; Liu, Dan; Qin, Wenjing; Zheng, Xudong; Liu, Yichao; Jiang, Changzhong
刊名	NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
	2014
卷号	334
关键词	Nanochannel film Radiation tolerance TEM Hardening
ISSN号	0168-583X
DOI	10.1016/j.nimb.2014.05.003
URL标识	查看原文
收录类别	SCIE ; EI
语种	英语
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4111101
专题	武汉大学
推荐引用方式 GB/T 7714	Zhang, Hongxiu,Ren, Feng,Wang, Yongqiang,et al. Enhanced radiation tolerance of nanochannel V films through defects release[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,2014,334.
APA	Zhang, Hongxiu.,Ren, Feng.,Wang, Yongqiang.,Hong, Mengqing.,Xiao, Xiangheng.,...&Jiang, Changzhong.(2014).Enhanced radiation tolerance of nanochannel V films through defects release.NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,334.
MLA	Zhang, Hongxiu,et al."Enhanced radiation tolerance of nanochannel V films through defects release".NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 334(2014).

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