Determination of microamount of silicon in steel by inductively coupled plasma-atomic emission spectrometry

	Determination of microamount of silicon in steel by inductively coupled plasma-atomic emission spectrometry
	Gong, J ; Zhang, WL ; Qiu, DR ; Yang, PY ; Hu, K ; Wang, H ; You, JF
刊名	CHINESE JOURNAL OF ANALYTICAL CHEMISTRY
	2000
卷号	28 期号:8 页码:971-973
ISSN号	0253-3820
通讯作者	Gong, J, Fudan Univ, Dept Chem, Shanghai 200433, Peoples R China
学科主题	Chemistry, Analytical
收录类别	SCI
语种	中文
公开日期	2012-03-24
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/95845]
专题	上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式 GB/T 7714	Gong, J,Zhang, WL,Qiu, DR,et al. Determination of microamount of silicon in steel by inductively coupled plasma-atomic emission spectrometry[J]. CHINESE JOURNAL OF ANALYTICAL CHEMISTRY,2000,28(8):971-973.
APA	Gong, J.,Zhang, WL.,Qiu, DR.,Yang, PY.,Hu, K.,...&You, JF.(2000).Determination of microamount of silicon in steel by inductively coupled plasma-atomic emission spectrometry.CHINESE JOURNAL OF ANALYTICAL CHEMISTRY,28(8),971-973.
MLA	Gong, J,et al."Determination of microamount of silicon in steel by inductively coupled plasma-atomic emission spectrometry".CHINESE JOURNAL OF ANALYTICAL CHEMISTRY 28.8(2000):971-973.