Electron field emission properties of as-deposited and nitrogen implanted tetrahedral amorphous carbon films

	Electron field emission properties of as-deposited and nitrogen implanted tetrahedral amorphous carbon films
	Zhao, JP ; Chen, ZY ; Wang, X ; Shi, TS
刊名	JOURNAL OF NON-CRYSTALLINE SOLIDS
	2001
卷号	291 期号:3 页码:181-186
关键词	DIAMOND-LIKE CARBON THIN-FILMS AFFINITY SURFACES CATHODES MICROSCOPY
ISSN号	0022-3093
通讯作者	Zhao, JP, Minist Int Trade & Ind, AIST, Shikoku Natl Res Inst, 2217-14 Hayashi Cho, Takamatsu, Kagawa 7610395, Japan
学科主题	Materials Science, Ceramics; Materials Science, Multidisciplinary
收录类别	SCI
语种	英语
公开日期	2012-03-24
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/95757]
专题	上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式 GB/T 7714	Zhao, JP,Chen, ZY,Wang, X,et al. Electron field emission properties of as-deposited and nitrogen implanted tetrahedral amorphous carbon films[J]. JOURNAL OF NON-CRYSTALLINE SOLIDS,2001,291(3):181-186.
APA	Zhao, JP,Chen, ZY,Wang, X,&Shi, TS.(2001).Electron field emission properties of as-deposited and nitrogen implanted tetrahedral amorphous carbon films.JOURNAL OF NON-CRYSTALLINE SOLIDS,291(3),181-186.
MLA	Zhao, JP,et al."Electron field emission properties of as-deposited and nitrogen implanted tetrahedral amorphous carbon films".JOURNAL OF NON-CRYSTALLINE SOLIDS 291.3(2001):181-186.