Energy dependence of methyl-radical adsorption on diamond (001)-(2 x 1) surface
Huang, Z ; Pan, ZY ; Zhu, WJ ; Wang, YX ; Du, AJ
刊名SURFACE & COATINGS TECHNOLOGY
2001
卷号141期号:2-3页码:246-251
关键词CHEMICAL-VAPOR-DEPOSITION MOLECULAR-DYNAMICS GROWTH SIMULATIONS MECHANISM FILMS C2H2 JET
ISSN号0257-8972
通讯作者Pan, ZY, Fudan Univ, Inst Modern Phys, State Key Lab Mat Modificat Laser Ion & Electron, Shanghai 200433, Peoples R China
学科主题Materials Science, Coatings & Films; Physics, Applied
收录类别SCI
语种英语
公开日期2012-03-24
内容类型期刊论文
源URL[http://ir.sim.ac.cn/handle/331004/95667]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Huang, Z,Pan, ZY,Zhu, WJ,et al. Energy dependence of methyl-radical adsorption on diamond (001)-(2 x 1) surface[J]. SURFACE & COATINGS TECHNOLOGY,2001,141(2-3):246-251.
APA Huang, Z,Pan, ZY,Zhu, WJ,Wang, YX,&Du, AJ.(2001).Energy dependence of methyl-radical adsorption on diamond (001)-(2 x 1) surface.SURFACE & COATINGS TECHNOLOGY,141(2-3),246-251.
MLA Huang, Z,et al."Energy dependence of methyl-radical adsorption on diamond (001)-(2 x 1) surface".SURFACE & COATINGS TECHNOLOGY 141.2-3(2001):246-251.
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