Studying the high-field electron conduction of tetrahedral amorphous carbon thin films by conducting atomic force microscopy
Luo, EZ ; Lin, S ; Xie, Z ; Xu, JB ; Wilson, IH ; Yu, YH ; Yu, LJ ; Wang, X
刊名MATERIALS CHARACTERIZATION
2002
卷号48期号:2-3页码:205-210
关键词EMISSION MECHANISMS DIAMOND
ISSN号1044-5803
通讯作者Luo, EZ, Chinese Univ Hong Kong, Dept Elect Engn, Hong Kong, Hong Kong, Peoples R China
学科主题Materials Science, Characterization & Testing
收录类别SCI
语种英语
公开日期2012-03-24
内容类型期刊论文
源URL[http://ir.sim.ac.cn/handle/331004/95634]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Luo, EZ,Lin, S,Xie, Z,et al. Studying the high-field electron conduction of tetrahedral amorphous carbon thin films by conducting atomic force microscopy[J]. MATERIALS CHARACTERIZATION,2002,48(2-3):205-210.
APA Luo, EZ.,Lin, S.,Xie, Z.,Xu, JB.,Wilson, IH.,...&Wang, X.(2002).Studying the high-field electron conduction of tetrahedral amorphous carbon thin films by conducting atomic force microscopy.MATERIALS CHARACTERIZATION,48(2-3),205-210.
MLA Luo, EZ,et al."Studying the high-field electron conduction of tetrahedral amorphous carbon thin films by conducting atomic force microscopy".MATERIALS CHARACTERIZATION 48.2-3(2002):205-210.
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