Study on electron emission suppression characteristic of molybdenum grid coated with Hf film by ion beam assisted deposition | |
Jiang,J ; Jiang,BY ; Ren,C ; Feng,T ; Wang,X ; Liu,XH ; Zou,SC | |
刊名 | APPLIED SURFACE SCIENCE |
2005 | |
卷号 | 239期号:3-4页码:437-444 |
ISSN号 | 0169-4332 |
通讯作者 | Jiang, J, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Res Ctr Semicond Funct Film Engn Technol, 865 Changning Rd, Shanghai 200050, Peoples R China |
学科主题 | Chemistry ; Physical; Materials Science ; Coatings & Films; Physics ; Applied; Physics ; Condensed Matter |
收录类别 | SCI |
公开日期 | 2012-03-24 |
内容类型 | 期刊论文 |
源URL | [http://ir.sim.ac.cn/handle/331004/95288] |
专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
推荐引用方式 GB/T 7714 | Jiang,J,Jiang,BY,Ren,C,et al. Study on electron emission suppression characteristic of molybdenum grid coated with Hf film by ion beam assisted deposition[J]. APPLIED SURFACE SCIENCE,2005,239(3-4):437-444. |
APA | Jiang,J.,Jiang,BY.,Ren,C.,Feng,T.,Wang,X.,...&Zou,SC.(2005).Study on electron emission suppression characteristic of molybdenum grid coated with Hf film by ion beam assisted deposition.APPLIED SURFACE SCIENCE,239(3-4),437-444. |
MLA | Jiang,J,et al."Study on electron emission suppression characteristic of molybdenum grid coated with Hf film by ion beam assisted deposition".APPLIED SURFACE SCIENCE 239.3-4(2005):437-444. |
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