Scaling of thermally activated dissipation in epitaxial YBa2Cu3O7-delta thin films

	Scaling of thermally activated dissipation in epitaxial YBa2Cu3O7-delta thin films
	Wang, ZH
刊名	SUPERCONDUCTOR SCIENCE & TECHNOLOGY
	1999
卷号	12 期号:7 页码:421-425
关键词	HIGH-TEMPERATURE SUPERCONDUCTORS COPPER-OXIDE SUPERCONDUCTORS THERMODYNAMIC FLUCTUATIONS RESISTIVE TRANSITION FLUX MOTION CU-O MAGNETORESISTANCE LATTICE CRYSTAL CREEP
ISSN号	0953-2048
通讯作者	Wang, ZH, Chinese Acad Sci, Shanghai Inst Met, Shanghai 200050, Peoples R China
学科主题	Physics, Applied; Physics, Condensed Matter
收录类别	SCI
语种	英语
公开日期	2012-03-25
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/99065]
专题	上海微系统与信息技术研究所_功能材料与器件_期刊论文（1999年以前)
推荐引用方式 GB/T 7714	Wang, ZH. Scaling of thermally activated dissipation in epitaxial YBa2Cu3O7-delta thin films[J]. SUPERCONDUCTOR SCIENCE & TECHNOLOGY,1999,12(7):421-425.
APA	Wang, ZH.(1999).Scaling of thermally activated dissipation in epitaxial YBa2Cu3O7-delta thin films.SUPERCONDUCTOR SCIENCE & TECHNOLOGY,12(7),421-425.
MLA	Wang, ZH."Scaling of thermally activated dissipation in epitaxial YBa2Cu3O7-delta thin films".SUPERCONDUCTOR SCIENCE & TECHNOLOGY 12.7(1999):421-425.