Characterization of gadolinium oxide film by pulse laser deposition

	Characterization of gadolinium oxide film by pulse laser deposition
	Cheng, XH ; Xu, DP ; Song, ZR ; He, DW ; Yu, YH ; Zhao, QT ; Shen, DS
刊名	APPLIED SURFACE SCIENCE
	2009
卷号	256 期号:3 页码:921-923
关键词	SILICON PR2O3 GD2O3
ISSN号	0169-4332
通讯作者	Cheng, XH, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Changning Rd 865, Shanghai 200050, Peoples R China
学科主题	Chemistry, Physical; Materials Science, Coatings & Films; Physics, Applied; Physics, Condensed Matter
收录类别	SCI
语种	英语
公开日期	2012-03-24
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/94885]
专题	上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式 GB/T 7714	Cheng, XH,Xu, DP,Song, ZR,et al. Characterization of gadolinium oxide film by pulse laser deposition[J]. APPLIED SURFACE SCIENCE,2009,256(3):921-923.
APA	Cheng, XH.,Xu, DP.,Song, ZR.,He, DW.,Yu, YH.,...&Shen, DS.(2009).Characterization of gadolinium oxide film by pulse laser deposition.APPLIED SURFACE SCIENCE,256(3),921-923.
MLA	Cheng, XH,et al."Characterization of gadolinium oxide film by pulse laser deposition".APPLIED SURFACE SCIENCE 256.3(2009):921-923.