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	A sacrificial layer strategy for photolithography on highly hydrophobic surface and its application for electrowetting devices.
	Zhang, Han; Yan, Qiuping; Xu, Qingyu*; Xiao, Changshi*; Liang, Xuelei*
刊名	SCIENTIFIC REPORTS
	2017
卷号	7期号:1页码:3983
ISSN号	2045-2322
DOI	10.1038/s41598-017-04342-z
URL标识	查看原文
WOS记录号	WOS:000403840000055
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/3382167
专题	武汉理工大学
作者单位	1.[Zhang, Han 2.Yan, Qiuping 3.Liang, Xuelei] Peking Univ, Key Lab Phys & Chem Nanodevices, Beijing 100871, Peoples R China.
推荐引用方式 GB/T 7714	Zhang, Han,Yan, Qiuping,Xu, Qingyu*,et al. A sacrificial layer strategy for photolithography on highly hydrophobic surface and its application for electrowetting devices.[J]. SCIENTIFIC REPORTS,2017,7(1):3983.
APA	Zhang, Han,Yan, Qiuping,Xu, Qingyu*,Xiao, Changshi*,&Liang, Xuelei*.(2017).A sacrificial layer strategy for photolithography on highly hydrophobic surface and its application for electrowetting devices..SCIENTIFIC REPORTS,7(1),3983.
MLA	Zhang, Han,et al."A sacrificial layer strategy for photolithography on highly hydrophobic surface and its application for electrowetting devices.".SCIENTIFIC REPORTS 7.1(2017):3983.

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