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	Effect of magnetron sputtering parameters and stress state of W film precursors on WSe2 layer texture by rapid selenization
	Li, Hongchao; Gao, Di; Xie, Senlin; Zou, Jianpeng*
刊名	Scientific Reports
	2016
卷号	6页码:36451
ISSN号	2045-2322
DOI	10.1038/srep36451
URL标识	查看原文
WOS记录号	WOS:000387018200001;PMID:27812031
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/3346404
专题	中南大学
作者单位	1.[Xie, Senlin 2.Zou, Jianpeng 3.Li, Hongchao 4.Gao, Di] Cent S Univ, State Key Lab Powder Met, Changsha 410083, Hunan, Peoples R China.
推荐引用方式 GB/T 7714	Li, Hongchao,Gao, Di,Xie, Senlin,et al. Effect of magnetron sputtering parameters and stress state of W film precursors on WSe2 layer texture by rapid selenization[J]. Scientific Reports,2016,6:36451.
APA	Li, Hongchao,Gao, Di,Xie, Senlin,&Zou, Jianpeng*.(2016).Effect of magnetron sputtering parameters and stress state of W film precursors on WSe2 layer texture by rapid selenization.Scientific Reports,6,36451.
MLA	Li, Hongchao,et al."Effect of magnetron sputtering parameters and stress state of W film precursors on WSe2 layer texture by rapid selenization".Scientific Reports 6(2016):36451.

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