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	Fluid simulation of the pulsed bias effect on inductively coupled nitrogen discharges for low-voltage plasma immersion ion implantation
	Sun, Xiao-Yan; Zhang, Yu-Ru; Li, Xue-Chun; Wang, You-Nian
刊名	CHINESE PHYSICS B
	2017
卷号	26
关键词	fluid simulation low-voltage plasma immersion ion implantation N-2 inductive discharge
ISSN号	1674-1056
URL标识	查看原文
WOS记录号	[DB:DC_IDENTIFIER_WOSID]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/3281404
专题	大连理工大学
作者单位	Dalian Univ Technol, Sch Phys & Optoelect Technol, Key Lab Mat Modificat Laser Ion & Electron Beams, Minist Educ, Dalian 116024, Peoples R China.
推荐引用方式 GB/T 7714	Sun, Xiao-Yan,Zhang, Yu-Ru,Li, Xue-Chun,et al. Fluid simulation of the pulsed bias effect on inductively coupled nitrogen discharges for low-voltage plasma immersion ion implantation[J]. CHINESE PHYSICS B,2017,26.
APA	Sun, Xiao-Yan,Zhang, Yu-Ru,Li, Xue-Chun,&Wang, You-Nian.(2017).Fluid simulation of the pulsed bias effect on inductively coupled nitrogen discharges for low-voltage plasma immersion ion implantation.CHINESE PHYSICS B,26.
MLA	Sun, Xiao-Yan,et al."Fluid simulation of the pulsed bias effect on inductively coupled nitrogen discharges for low-voltage plasma immersion ion implantation".CHINESE PHYSICS B 26(2017).

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