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	Deformation induced new pathways in silicon
	Zhang, Zhenyu; Cui, Junfeng; Chang, Keke; Liu, Dongdong; Chen, Guoxin; Jiang, Nan; Guo, Dongming
刊名	NANOSCALE
	2019
卷号	11页码:9862-9868
关键词	Calculations Deformation Electronics industry Nanoindentation Nanostructures Potential energy Transmission electron microscopy, Ab initio calculations Abrasive machining Average force Average potential Dynamic nanoindentation High performance devices Nanomechanical tests Transition mechanism, Silicon compounds
ISSN号	2040-3364
URL标识	查看原文
WOS记录号	[DB:DC_IDENTIFIER_WOSID]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/3225906
专题	大连理工大学
作者单位	1.Dalian Univ Technol, Minist Educ, Key Lab Precis & Nontradit Machining Technol, Dalian 116024, Peoples R China. 2.Dalian Univ Technol, Minist Educ, Key Lab Precis & Nontradit Machining Technol, Dalian 116024, Peoples R China. 3.Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Key Lab Marine Mat & Related Technol, Ningbo 315201, Zhejiang, Peoples R China. 4.Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Key Lab Marine Mat & Related Technol, Ningbo 315201, Zhejiang, Peoples R China.
推荐引用方式 GB/T 7714	Zhang, Zhenyu,Cui, Junfeng,Chang, Keke,et al. Deformation induced new pathways in silicon[J]. NANOSCALE,2019,11:9862-9868.
APA	Zhang, Zhenyu.,Cui, Junfeng.,Chang, Keke.,Liu, Dongdong.,Chen, Guoxin.,...&Guo, Dongming.(2019).Deformation induced new pathways in silicon.NANOSCALE,11,9862-9868.
MLA	Zhang, Zhenyu,et al."Deformation induced new pathways in silicon".NANOSCALE 11(2019):9862-9868.

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