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	Photoelectrochemically combined mechanical polishing of n-type gallium nitride wafer by using metal nanoparticles as photocathodes
	Ou, L.; Dong, Z.; Kang, R.; Shi, K.; Guo, D.
刊名	International Journal of Advanced Manufacturing Technology
	2019
ISSN号	02683768
URL标识	查看原文
WOS记录号	[DB:DC_IDENTIFIER_WOSID]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/3220110
专题	大连理工大学
作者单位	1.Institute of Advanced Manufacturing Technology, School of Mechanical Engineering, Dalian University of Technology, No. 2 Linggong Rd, Dalian, 116024, China 2.Department of Chemistry and State Key Laboratory of Physical Chemistry of Solid Surfaces, College of Chemistry and Chemical Engineering, Xiamen University, 422 Siming South Road, Xiamen, 361005, China
推荐引用方式 GB/T 7714	Ou, L.,Dong, Z.,Kang, R.,et al. Photoelectrochemically combined mechanical polishing of n-type gallium nitride wafer by using metal nanoparticles as photocathodes[J]. International Journal of Advanced Manufacturing Technology,2019.
APA	Ou, L.,Dong, Z.,Kang, R.,Shi, K.,&Guo, D..(2019).Photoelectrochemically combined mechanical polishing of n-type gallium nitride wafer by using metal nanoparticles as photocathodes.International Journal of Advanced Manufacturing Technology.
MLA	Ou, L.,et al."Photoelectrochemically combined mechanical polishing of n-type gallium nitride wafer by using metal nanoparticles as photocathodes".International Journal of Advanced Manufacturing Technology (2019).

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