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Photochemically combined mechanical polishing of N-type gallium nitride wafer in high efficiency
Ou, Li -Wei; Wang, Ya-Hui; Hu, Hui-Qing; Zhang, Liang-Liang; Dong, Zhi-Gang; Kang, Ren-Ke; Guo, Dong-Ming; Shi, Kang
刊名PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY
2019
卷号55页码:14-21
关键词Gallium nitride Chemical mechanical polishing Photo-assisted oxidation Potassium persulfate Material removal rate
ISSN号0141-6359
URL标识查看原文
WOS记录号[DB:DC_IDENTIFIER_WOSID]
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/3220104
专题大连理工大学
作者单位1.Dalian Univ Technol, Inst Adv Mfg Technol, Sch Mech Engn, 2 Linggong Rd, Dalian 116024, Peoples R China.
2.Xiamen Univ, Dept Chem, Coll Chem & Chem Engn, 422 Siming South Rd, Xiamen 361005, Peoples R China.,Xiamen Univ, State Key Lab Phys Chem Solid Surfaces, Coll Chem & Chem Engn, 422 Siming South Rd, Xiamen 361005, Peoples R China.
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GB/T 7714
Ou, Li -Wei,Wang, Ya-Hui,Hu, Hui-Qing,et al. Photochemically combined mechanical polishing of N-type gallium nitride wafer in high efficiency[J]. PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY,2019,55:14-21.
APA Ou, Li -Wei.,Wang, Ya-Hui.,Hu, Hui-Qing.,Zhang, Liang-Liang.,Dong, Zhi-Gang.,...&Shi, Kang.(2019).Photochemically combined mechanical polishing of N-type gallium nitride wafer in high efficiency.PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY,55,14-21.
MLA Ou, Li -Wei,et al."Photochemically combined mechanical polishing of N-type gallium nitride wafer in high efficiency".PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY 55(2019):14-21.
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