Low Deposition Temperature-Induced Changes of the Microstructure and Tribological Property of WS2 Film

	Low Deposition Temperature-Induced Changes of the Microstructure and Tribological Property of WS2 Film
	Weng LJ(翁立军)1 ; Sun JY(孙嘉奕)1 ; Gao XM(高晓明)1 ; Hu M(胡明)1 ; Dong Y(董毅)2; Wang Y(王燕)3 ; Wang DS(王德生)1 ; Jiang D(姜栋)1 ; Fu YL(伏彦龙)1
刊名	Coatings
	2019
期号	9 页码:227
语种	英语
内容类型	期刊论文
源URL	[http://ir.licp.cn/handle/362003/25898]
专题	兰州化学物理研究所_先进润滑与防护材料研究发展中心
通讯作者	Gao XM(高晓明); Wang DS(王德生)
作者单位	1.中国科学院兰州化学物理研究所 2.上海宇航系统工程研究所 3.中国空间技术研究院
推荐引用方式 GB/T 7714	Weng LJ,Sun JY,Gao XM,et al. Low Deposition Temperature-Induced Changes of the Microstructure and Tribological Property of WS2 Film[J]. Coatings,2019(9):227.
APA	Weng LJ.,Sun JY.,Gao XM.,Hu M.,Dong Y.,...&Fu YL.(2019).Low Deposition Temperature-Induced Changes of the Microstructure and Tribological Property of WS2 Film.Coatings(9),227.
MLA	Weng LJ,et al."Low Deposition Temperature-Induced Changes of the Microstructure and Tribological Property of WS2 Film".Coatings .9(2019):227.