Enhanced photoelectrochemical cathodic protection performance of g-C3N4 caused by the co-modification with N defects and C deposition

doi:10.1007/s10854-019-01899-5

CORC > 海洋研究所 > 中国科学院海洋研究所 > 海洋腐蚀与防护研究发展中心

	Enhanced photoelectrochemical cathodic protection performance of g-C3N4 caused by the co-modification with N defects and C deposition
	Zhang, Qingji 1; Jing, Jiangping 2,4,5; Chen, Zhuoyuan 2,3,4,5; Sun, Mengmeng 2,4,5; Li, Jiarun2,4,5 ; Li, Yan1 ; Xu, Likun 3
刊名	JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
	2019-08-01
卷号	30 期号:16 页码:15267-15276
ISSN号	0957-4522
DOI	10.1007/s10854-019-01899-5
通讯作者	Chen, Zhuoyuan(zychen@qdio.ac.cn) ; Li, Yan(yanlee@upc.edu.cn)
英文摘要	g-C3N4 is a promising material for the application in the area of photoelectrochemical cathodic protection. However, it suffers from limited light absorption and lower charge separation efficiency. In this work, a N defects and C deposition co-modified g-C3N4, C-g-C3Nx, was prepared by NaOH-assisted sintering and ethanol-assisted hydrothermal treatment. The presence of N defects and C deposition was verified by the XRD, SEM and XPS tests. The N defects changed the band structure of g-C3N4 by lowering down the conduction band position, therefore widening the light absorption range of g-C3N4. In addition, the N defects and C deposition co-modification promotes the charge transfer process of g-C3N4, leading to increased separation efficiency of the photogenerated charge carriers. Therefore, C-g-C3Nx shows enhanced photoelectrochemical cathodic protection performance for the coupled 316L stainless steel. It can provide a photoinduced potential drop of 120 mV and a photoinduced current density of 9.1 mu A cm(-2), which is three times that of pristine g-C3N4.
资助项目	National Natural Science Foundation of China[41676069] ; National Natural Science Foundation of China[41576114] ; National Natural Science Foundation of China[41376126] ; Qingdao Innovative Leading Talent Foundation[15-10-3-15-(39)-zch] ; Qingdao Science and Technology Achievement Transformation Guidance Plan (Applied Basic Research)[14-2-4-4-jch] ; State Key Laboratory for Marine Corrosion and Protection, Luoyang Ship Material Research Institute, China[614290101011703]
WOS研究方向	Engineering ; Materials Science ; Physics
语种	英语
出版者	SPRINGER
WOS记录号	WOS:000480558400045
内容类型	期刊论文
源URL	[http://ir.qdio.ac.cn/handle/337002/162354]
专题	海洋研究所_海洋腐蚀与防护研究发展中心
通讯作者	Chen, Zhuoyuan; Li, Yan
作者单位	1.China Univ Petr, Sch Mat Sci & Engn, 66 Changjiang West Rd, Qingdao 266580, Shandong, Peoples R China 2.Chinese Acad Sci, Inst Oceanol, Key Lab Marine Environm Corros & Biofouling, 7 Nanhai Rd, Qingdao 266071, Shandong, Peoples R China 3.Luoyang Ship Mat Res Inst, State Key Lab Marine Corros & Protect, Wenhai Rd, Qingdao 266237, Shandong, Peoples R China 4.Chinese Acad Sci, Ctr Ocean Mega Sci, 7 Nanhai Rd, Qingdao 266071, Shandong, Peoples R China 5.Pilot Natl Lab Marine Sci & Technol Qingdao, Open Studio Marine Corros & Protect, 1 Wenhai Rd, Qingdao 266237, Shandong, Peoples R China
推荐引用方式 GB/T 7714	Zhang, Qingji,Jing, Jiangping,Chen, Zhuoyuan,et al. Enhanced photoelectrochemical cathodic protection performance of g-C3N4 caused by the co-modification with N defects and C deposition[J]. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS,2019,30(16):15267-15276.
APA	Zhang, Qingji.,Jing, Jiangping.,Chen, Zhuoyuan.,Sun, Mengmeng.,Li, Jiarun.,...&Xu, Likun.(2019).Enhanced photoelectrochemical cathodic protection performance of g-C3N4 caused by the co-modification with N defects and C deposition.JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS,30(16),15267-15276.
MLA	Zhang, Qingji,et al."Enhanced photoelectrochemical cathodic protection performance of g-C3N4 caused by the co-modification with N defects and C deposition".JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS 30.16(2019):15267-15276.