Tuning the microstructure and mechanical properties of magnetron sputtered Cu-Cr thin films: The optimal Cr addition | |
Li, X. G.[1]; Cao, L. F.[2,3]; Zhang, J. Y.[1]; Li, J.[1]; Zhao, J. T.[1]; Feng, X. B.[1]; Wang, Y. Q.[1]; Wu, K.[1]; Zhang, P.[1]; Liu, G.[1] | |
2018 | |
卷号 | 151页码:87-99 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/3193495 |
专题 | 重庆大学 |
推荐引用方式 GB/T 7714 | Li, X. G.[1],Cao, L. F.[2,3],Zhang, J. Y.[1],et al. Tuning the microstructure and mechanical properties of magnetron sputtered Cu-Cr thin films: The optimal Cr addition[J],2018,151:87-99. |
APA | Li, X. G.[1].,Cao, L. F.[2,3].,Zhang, J. Y.[1].,Li, J.[1].,Zhao, J. T.[1].,...&Sun, J.[1].(2018).Tuning the microstructure and mechanical properties of magnetron sputtered Cu-Cr thin films: The optimal Cr addition.,151,87-99. |
MLA | Li, X. G.[1],et al."Tuning the microstructure and mechanical properties of magnetron sputtered Cu-Cr thin films: The optimal Cr addition".151(2018):87-99. |
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