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	3-D finite element calculation of electric field enhancement for nanostructures fabrication mechanism on silicon surface with AFM tip induced local anodic oxidation
	Theogene, Barayavuga; Cui, Jianlei; Wang, Xuewen; Wang, Wenjun; Mei, Xuesong; Yi, Peiyun; Yang, Xinju; He, Xiaoqiao; Xie, Hui
刊名	INTEGRATED FERROELECTRICS
	2018
卷号	190页码:129-141
关键词	AFM and surface characterization Electric field enhancement nano dot nanolithography based on tip (NBT) scanning probe tip
ISSN号	1058-4587
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2920633
专题	西安交通大学
推荐引用方式 GB/T 7714	Theogene, Barayavuga,Cui, Jianlei,Wang, Xuewen,et al. 3-D finite element calculation of electric field enhancement for nanostructures fabrication mechanism on silicon surface with AFM tip induced local anodic oxidation[J]. INTEGRATED FERROELECTRICS,2018,190:129-141.
APA	Theogene, Barayavuga.,Cui, Jianlei.,Wang, Xuewen.,Wang, Wenjun.,Mei, Xuesong.,...&Xie, Hui.(2018).3-D finite element calculation of electric field enhancement for nanostructures fabrication mechanism on silicon surface with AFM tip induced local anodic oxidation.INTEGRATED FERROELECTRICS,190,129-141.
MLA	Theogene, Barayavuga,et al."3-D finite element calculation of electric field enhancement for nanostructures fabrication mechanism on silicon surface with AFM tip induced local anodic oxidation".INTEGRATED FERROELECTRICS 190(2018):129-141.

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