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	Improvement and application of pad conditioning accuracy in chemical mechanical polishing
	Ban, Xinxing; Zhao, Huiying; Zhu, Xueliang; Zhao, Shijie; Xie, Ruiqing; Liao, Defeng
刊名	Optical Engineering
	2018
卷号	57
关键词	Application process Chemical mechanical polishing(CMP) Density distributions Diamond conditioners Kinematic Analysis Optical processing Planarity Process parameters
ISSN号	0091-3286
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2919338
专题	西安交通大学
推荐引用方式 GB/T 7714	Ban, Xinxing,Zhao, Huiying,Zhu, Xueliang,et al. Improvement and application of pad conditioning accuracy in chemical mechanical polishing[J]. Optical Engineering,2018,57.
APA	Ban, Xinxing,Zhao, Huiying,Zhu, Xueliang,Zhao, Shijie,Xie, Ruiqing,&Liao, Defeng.(2018).Improvement and application of pad conditioning accuracy in chemical mechanical polishing.Optical Engineering,57.
MLA	Ban, Xinxing,et al."Improvement and application of pad conditioning accuracy in chemical mechanical polishing".Optical Engineering 57(2018).

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