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	Anomalous formation of micrometer-thick amorphous oxide surficial layers during high-temperature oxidation of ZrAl2
	Hu, Z.a; Xu, Y.a; Chen, Y.a; Schützendübe, P.b; Wang, J.c; Huang, Y.a; Liu, Y.a; Wang, Z.a
刊名	Journal of Materials Science & Technology
	2019
卷号	Vol.35 No.7页码:27
关键词	Thermal oxidation Zr-Al alloys Amorphous oxides Oxidation kinetics Interface thermodynamics
ISSN号	1005-0302
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2899672
专题	天津大学
作者单位	1.aSchool of Materials Science and Engineering, Tianjin University, Tianjin, 300350, China 2.bMax Planck Institute for Intelligent Systems, Heisenbergstrasse 3, Stuttgart, D-70569, Germany 3.cDepartment of Physics, Shantou University, Shantou, 515063, China
推荐引用方式 GB/T 7714	Hu, Z.a,Xu, Y.a,Chen, Y.a,et al. Anomalous formation of micrometer-thick amorphous oxide surficial layers during high-temperature oxidation of ZrAl2[J]. Journal of Materials Science & Technology,2019,Vol.35 No.7:27.
APA	Hu, Z.a.,Xu, Y.a.,Chen, Y.a.,Schützendübe, P.b.,Wang, J.c.,...&Wang, Z.a.(2019).Anomalous formation of micrometer-thick amorphous oxide surficial layers during high-temperature oxidation of ZrAl2.Journal of Materials Science & Technology,Vol.35 No.7,27.
MLA	Hu, Z.a,et al."Anomalous formation of micrometer-thick amorphous oxide surficial layers during high-temperature oxidation of ZrAl2".Journal of Materials Science & Technology Vol.35 No.7(2019):27.

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