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	Ferromagnetic resonance of facing-target sputtered epitaxial gamma \'-Fe4N films: the influence of thickness and substrates
	Lai, Z.a; Li, Z.a; Liu, X.a; Bai, L.b; Tian, Y.b; Mi, W.a
刊名	JOURNAL OF PHYSICS D-APPLIED PHYSICS
	2018
卷号	Vol.51 No.24
关键词	gamma \'-Fe4N ferromagnetic resonance magnetic damping two-magnon scattering
ISSN号	0022-3727
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2897351
专题	天津大学
作者单位	1.aTianjin Key Laboratory of Low Dimensional Materials Physics and Preparation Technology, School of Science, Tianjin University, Tianjin, 300354, China 2.bState Key Laboratory of Crystal Materials, School of Physics, Shandong University, Jinan, Shandong, 250100, China
推荐引用方式 GB/T 7714	Lai, Z.a,Li, Z.a,Liu, X.a,et al. Ferromagnetic resonance of facing-target sputtered epitaxial gamma \'-Fe4N films: the influence of thickness and substrates[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS,2018,Vol.51 No.24.
APA	Lai, Z.a,Li, Z.a,Liu, X.a,Bai, L.b,Tian, Y.b,&Mi, W.a.(2018).Ferromagnetic resonance of facing-target sputtered epitaxial gamma \'-Fe4N films: the influence of thickness and substrates.JOURNAL OF PHYSICS D-APPLIED PHYSICS,Vol.51 No.24.
MLA	Lai, Z.a,et al."Ferromagnetic resonance of facing-target sputtered epitaxial gamma \'-Fe4N films: the influence of thickness and substrates".JOURNAL OF PHYSICS D-APPLIED PHYSICS Vol.51 No.24(2018).

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